The science and design of partially ionized plasma and plasma processing devices used in applications such as etching and deposition at the nanoscale. Gas phase collisions, transport parameters, DC and RF glow discharges, the plasma sheath, sputtering, etching, and plasma deposition.
Plasma Processing At The Nanoscale
Host University
Old Dominion University
Semester
Fall 2023
Course Number
ECE 572
CRN
22929
Credits
3
Discipline
Electrical & Computer Engineering
Instructor
Laroussi, Mounir ( MLAROUSS@ODU.EDU)
Times and Days
04:20 PM - 07:00 PM
M
Course Information
Prerequisites
(Offered fall) Prerequisites: ECE 323.