The science and design of partially ionized plasma and plasma processing devices used in applications such as etching and deposition at the nanoscale. Gas phase collisions, transport parameters, DC and RF glow discharges, the plasma sheath, sputtering, etching, and plasma deposition. (Offered fall)
Plasma Processing at the Nanoscale
Host University
Old Dominion University
Semester
Fall 2022
Course Number
ECE 572 CRN 23115
Credits
3
Discipline
Electrical & Computer Engineering
Instructor
Laroussi, Mounir (MLAROUSS@ODU.EDU)
Course Information
Prerequisites
ECE 323.