Plasma Processing at the Nanoscale

Host University

Old Dominion University

Semester

Fall 2022

Course Number

ECE 572 CRN 23115

Credits

3

Discipline

Electrical & Computer Engineering

Instructor

Laroussi, Mounir (MLAROUSS@ODU.EDU)

Course Information

The science and design of partially ionized plasma and plasma processing devices used in applications such as etching and deposition at the nanoscale. Gas phase collisions, transport parameters, DC and RF glow discharges, the plasma sheath, sputtering, etching, and plasma deposition. (Offered fall)

Prerequisites

ECE 323.